Ming-Li Kung

Title: The Innovative Contributions of Ming-Li Kung

Introduction

Ming-Li Kung is a notable inventor based in Kee-Lung, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding a total of 4 patents. His innovative approaches have paved the way for advancements in cleaning methods and metal interconnect structures.

Latest Patents

One of his latest patents is a dry cleaning method that replaces traditional wet cleaning after metal etching. This method involves cleaning an etched metallization structure by introducing a fluorine-containing gas and an oxygen-containing gas mixture into a processing chamber. This process is conducted without the use of a downstream microwave while applying a magnetic field and maintaining a pressure of less than about 50 millitorr for a predetermined time. Another significant patent is a method of forming tungsten interconnects and vias without tungsten loss during the wet stripping of photoresist polymer. This method includes forming tungsten via plugs, depositing a metal layer, and patterning and etching the metal layer using a photoresist layer. The photoresist layer is then removed using a combination of oxygen plasma and water vapor, ensuring a ratio of less than one.

Career Highlights

Ming-Li Kung has worked with prominent companies in the semiconductor industry, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His experience in these organizations has contributed to his expertise in semiconductor fabrication and innovation.

Collaborations

Throughout his career, Ming-Li Kung has collaborated with talented individuals such as Hong-Long Chang and Chun-Wei Chen. These collaborations have further enhanced his work and contributions to the field.

Conclusion

Ming-Li Kung's innovative patents and career achievements highlight his significant role in advancing semiconductor technology. His work continues to influence the industry and inspire future innovations.