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For the Inventor, By the Inventor

Ballston Lake, NY, United States of America

Ming Lei

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Globalfoundries Inc.. Active years: 2015-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ming Lei. Retrieved from https://idiyas.com/inventor/ming-lei-11moyqfq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 33.3

Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Malta, NY (US) (2015 - 2016)
  • Ballston Lake, NY (US) (2017 - 2019)
  • Bellevue, WA (US) (2020)

Company Filing History:

goldMedal6 out of 5,671 
 
Globalfoundries Inc.
 patents

Years Active: 2015-2020

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6 patents (USPTO):Explore Patents
1. 10816483 - Double pass diluted ultraviolet reticle inspection (2020-10-27),
2. 10451666 - Methodology for early detection of TS to PC short issue (2019-10-22),
3. 9735064 - Charge dynamics effect for detection of voltage contrast defect and determination of shorting location (2017-08-15),
4. 9601392 - Device characterization by time dependent charging dynamics (2017-03-21),
5. 9506874 - Infrared-based metrology for detection of stress and defects around through silicon vias (2016-11-29),
6. 9041919 - Infrared-based metrology for detection of stress and defects around through silicon vias (2015-05-26),

Title: Innovations by Inventor Ming Lei

Introduction

Ming Lei is a notable inventor based in Ballston Lake, NY (US), recognized for his contributions to the field of semiconductor technology. With a total of six patents to his name, he has made significant advancements in reticle inspection systems and defect detection methodologies.

Latest Patents

Ming Lei's latest patents include a "Double pass diluted ultraviolet reticle inspection" system. This innovative system features a concave spherical mirror that reflects inspection light transmitted through the reticle, allowing for detailed inspection images to be created. The system is designed to identify defects in the reticle by analyzing these images. Another significant patent is the "Methodology for early detection of TS to PC short issue." This method enables in-line detection of TS-PC short defects during the TS-CMP processing stage, enhancing the reliability of semiconductor devices.

Career Highlights

Ming Lei is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work focuses on improving inspection techniques and defect detection processes, which are crucial for the production of high-quality semiconductor devices.

Collaborations

Ming Lei collaborates with talented coworkers such as Byoung-Gi Min and Xusheng Kevin Wu, contributing to a dynamic team environment that fosters innovation and excellence in semiconductor technology.

Conclusion

Ming Lei's innovative patents and contributions to the semiconductor industry highlight his expertise and commitment to advancing technology. His work continues to impact the field positively, ensuring the development of reliable and efficient semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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