Ming-Jer Chiu

Title: Innovations of Ming-Jer Chiu

Introduction

Ming-Jer Chiu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on improving the efficiency and effectiveness of semiconductor structures and photo mask technologies.

Latest Patents

One of his latest patents involves a wiring layout having differently shaped vias. This patent describes a method for forming photo masks with rectangular patterns, which is crucial for creating semiconductor structures. The method includes determining a minimum spacing and identifying vertical conductive feature patterns that have a spacing less than this minimum value. It further involves determining a first direction to expand and a second direction to shrink, while checking against design rules to ensure compliance. If the design rules are not violated, the identified vertical conductive feature pattern is replaced with a revised pattern that has a rectangular shape. The photo masks are then formed, allowing for the successful creation of the semiconductor structure.

Career Highlights

Ming-Jer Chiu has worked with notable organizations such as the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company Ltd. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Ming-Jer has collaborated with esteemed colleagues, including Kong-Beng Thei and Chih-Tsung Yao. These collaborations have further enhanced his research and development efforts in the semiconductor field.

Conclusion

Ming-Jer Chiu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the future of the industry.