Company Filing History:
Years Active: 2019-2022
Title: The Innovations of Ming Hua Du
Introduction
Ming Hua Du is a prominent inventor based in Singapore, known for his contributions to the field of semiconductor technology. With a total of 4 patents to his name, he has made significant strides in developing advanced semiconductor devices.
Latest Patents
Ming Hua Du's latest patents include innovative designs for semiconductor devices. One of his notable inventions is a semiconductor device that features an oxide semiconductor layer disposed over a substrate. This device incorporates a source electrode of a metal nitride and a drain electrode of the same material, both placed on the oxide semiconductor layer. Additionally, a metal-nitride oxidation layer is formed on the surfaces of the source and drain electrodes. A key aspect of this invention is that the ratio of the thickness of the metal-nitride oxidation layer to the thickness of either the drain or source electrode is equal to or less than 0.2. Another patent focuses on a similar semiconductor device and method for fabricating the same, emphasizing the same structural features and ratios.
Career Highlights
Ming Hua Du is currently employed at United Microelectronics Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and effective for various applications.
Collaborations
Ming Hua Du has collaborated with several talented individuals in his field, including Yen-Chen Chen and Hai Tao Liu. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Ming Hua Du's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence the future of semiconductor devices, paving the way for advancements in technology.