Taipei, Taiwan

Ming-Cheng Yang


Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 153(Granted Patents)


Company Filing History:


Years Active: 1999-2004

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7 patents (USPTO):Explore Patents

Title: The Innovations of Ming-Cheng Yang

Introduction

Ming-Cheng Yang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 7 patents to his name, Yang has developed innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Yang's latest patents is a chemical mechanical polishing (CMP) apparatus with temperature control. This apparatus is designed to control the circular zone temperature of the wafer during the polishing process. It comprises a platen, a carrier that holds the wafer against the platen, a guide ring to mount the wafer, and a heater that can be positioned in various locations. The heater's temperature is adjustable between 20°C and 60°C, which improves the polishing rate at the edge of the wafer and reduces the polishing difference between the edge and the center.

Another notable patent is a method for avoiding defects produced in the CMP process. This method involves sequentially depositing a first dielectric layer and a second dielectric layer on a semiconductor substrate. The process includes forming a plurality of first holes in predetermined contact window areas, wet etching the first dielectric layer, and filling the second holes with a conductive layer before performing the CMP process to level off the layers.

Career Highlights

Ming-Cheng Yang has worked with several notable companies throughout his career, including Promos Technologies, Inc. and United Microelectronics Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Yang has collaborated with several professionals in his field, including Jiun-Fang Wang and Champion Yi. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in CMP processes.

Conclusion

Ming-Cheng Yang's contributions to the field of chemical mechanical polishing have made a significant impact on semiconductor manufacturing. His innovative patents and collaborative efforts continue to drive advancements in this critical area of technology.

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