Min-Yung Ko

Title: Min-Yung Ko: Innovator in Semiconductor Technology

Introduction

Min-Yung Ko is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of memory cell formation.

Latest Patents

One of his latest patents is titled "Method for forming a hard mask with a tapered profile." This patent describes a method for forming a memory cell that involves depositing a memory film over a substrate, which includes a bottom electrode layer, a top electrode layer, and a data storage film situated between the two electrode layers. A hard mask film is then deposited over the memory film, which consists of a conductive hard mask layer. The top electrode layer and the hard mask film are patterned to create a top electrode and a hard mask over the top electrode. A trimming process is performed to reduce the sidewall angle between the hard mask's sidewall and its bottom surface. An etch is subsequently executed into the data storage film while the hard mask is in place, resulting in the formation of a data storage structure beneath the top electrode.

Another notable patent is "By-site-compensated etch back for local planarization/topography adjustment." In this patent, a workpiece is positioned on a support that features multiple temperature control zones. The pre-etch surface topography is assessed by measuring various pre-etch surface heights or thicknesses at multiple sites on the workpiece. The temperature control zones are adjusted based on these measurements, allowing for a dry etch to be conducted while maintaining different temperatures across the zones.

Career Highlights

Min-Yung Ko is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches and patents have contributed to advancements in memory cell technology, showcasing his expertise and commitment to the field.

Collaborations

Throughout his career, Min-Yung Ko has collaborated with notable colleagues, including Shih-Chang Liu and Chern-Yow Hsu. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Min-Yung Ko is a distinguished inventor whose contributions to semiconductor technology have been recognized through multiple patents. His innovative methods for memory cell formation and etching processes demonstrate his significant impact on the industry. His work continues