Min Jiao

Title: Min Jiao: Innovator in Semiconductor Technology

Introduction

Min Jiao is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

One of Min Jiao's latest patents is titled "Method of fabricating a gate cut feature for multi-gate semiconductor devices." This method involves forming a fin protruding from a substrate and creating a first dielectric feature adjacent to the fin. The process includes forming a cladding layer over the fin and the first dielectric feature, followed by the removal of a portion of the cladding layer to create an opening that exposes the first dielectric feature. The method further includes forming a second dielectric feature adjacent to the cladding layer, which fills the opening, and forming a dummy gate stack over the fin and the second dielectric feature. This innovative approach ultimately leads to the replacement of the dummy gate stack and the cladding layer with a metal gate stack, effectively dividing the metal gate stack with the second dielectric feature.

Another notable patent is "Method and multi-channel devices with anti-punch-through features." This patent describes a method that begins with receiving a substrate that has a semiconductor surface of a first semiconductor material. The process includes forming an APT feature in the substrate and performing a prebaking process at a specific temperature. It also involves epitaxially growing an undoped semiconductor layer and a semiconductor layer stack over it, followed by patterning the substrate to form a trench that defines an active region. The method concludes with the formation of a gate structure that wraps around each of the first semiconductor layers, showcasing Min Jiao's innovative approach to semiconductor design.

Career Highlights

Min Jiao is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies that are essential for modern electronic devices.

Collaborations

Throughout his career, Min Jiao has collaborated with notable colleagues, including Da-Wen Lin and Ming-Yuan Wu. These collaborations have further enriched his research and development efforts in semiconductor technology.

Conclusion

Min Jiao's contributions to semiconductor technology through his innovative patents and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as