Hsinchu, Taiwan

Min-Hsuan Lu

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.1

ph-index = 1


Company Filing History:


Years Active: 2025

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: **Innovator Min-Hsuan Lu: Pioneering Semiconductor Device Technology**

Introduction

Min-Hsuan Lu is a prominent inventor based in Hsinchu, Taiwan. With three registered patents, he has made significant contributions to the field of semiconductor devices. His innovative approaches and techniques are paving the way for advancements in technology.

Latest Patents

Among Min-Hsuan Lu's notable inventions is a patented method for forming a semiconductor device. This method involves several critical steps: a transistor is formed and embedded within a dielectric layer situated over a semiconductor substrate. The process includes a first gate cutting procedure to create a first opening in the dielectric layer, followed by the formation of an insulator post within this opening. A second gate cutting process results in a second opening, where a power via is established, leading to the creation of a conductor that is embedded in the substrate and connected to the power via.

Another significant patent from Lu is the design of a buried conductive structure in a semiconductor substrate. This structure features an epitaxial region adjacent to a nanostructured gate layer and channel layer. It incorporates a first silicide layer in the top portion, along with a corresponding first conductive structure on its surface. Additionally, a second silicide layer is detailed within the bottom portion of the epitaxial region, featuring a second conductive structure traversing through the substrate, ensuring effective electrical connections.

Career Highlights

Min-Hsuan Lu has dedicated a significant portion of his career to Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to refine his expertise in semiconductor technologies, driving innovations that significantly impact the field.

Collaborations

Throughout his career, Min-Hsuan Lu has collaborated with talented colleagues such as Lin-Yu Huang and Kan-Ju Lin. These collaborations enhance the creative process, fostering an environment where cutting-edge ideas can flourish and lead to groundbreaking inventions.

Conclusion

Min-Hsuan Lu continues to push the boundaries of semiconductor technology through his innovative patents and collaborative efforts. His work not only exemplifies the spirit of invention but also contributes significantly to the advancement of semiconductor devices, making a lasting impact on the industry.

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