Min Han Hsu

Title: Min Han Hsu: Innovator in Semiconductor Technology

Introduction

Min Han Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approaches to device manufacturing.

Latest Patents

Hsu's latest patents include a method of making a semiconductor device and a replacement metal gate device structure. The first patent describes a method that involves depositing a metallic hardmask over a dielectric layer, etching a hardmask opening, and modifying the sidewall of the opening by adding non-metal atoms. This process culminates in the deposition of a conductive material within the opening. His second patent focuses on a semiconductor device that features a semiconductor fin and a gate stack, which includes a gate dielectric layer, a work function material layer with dopants, and a gate electrode layer, ensuring that the gate dielectric layer remains free of dopants.

Career Highlights

Throughout his career, Min Han Hsu has worked with notable companies such as Taiwan Semiconductor Manufacturing Company Limited and TSMC Nanjing Company, Limited. His experience in these leading firms has allowed him to refine his expertise in semiconductor manufacturing processes.

Collaborations

Hsu has collaborated with esteemed colleagues, including Jung-Chih Tsao and Chun-Chang Chen, contributing to advancements in semiconductor technology.

Conclusion

Min Han Hsu's innovative work in semiconductor technology and his contributions through patents highlight his role as a key figure in the industry. His advancements continue to influence the development of semiconductor devices.