Min-Chung Cheng

Title: Min-Chung Cheng: Innovator in Semiconductor Technology

Introduction

Min-Chung Cheng is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on innovative methods for enhancing semiconductor structures, which are crucial for modern electronic devices.

Latest Patents

Among his latest patents is a semiconductor structure having buried word lines. This patent outlines a method for forming a semiconductor structure that includes a substrate with an isolation region and an active region. The process involves creating a hard mask on the substrate and performing an etching process to achieve specific top surface levels of dielectric and gate electrode materials. This innovation aims to improve the efficiency and performance of semiconductor devices.

Another notable patent by Cheng is also related to semiconductor structures with buried word lines. This patent details a similar method of forming a semiconductor structure, emphasizing the importance of the isolation trench filled with dielectric material and the gate trench filled with gate electrode material. The advancements presented in these patents are vital for the ongoing evolution of semiconductor technology.

Career Highlights

Min-Chung Cheng has worked with several reputable companies throughout his career. Notably, he has been associated with Nan Ya Technology Corporation and Chunghwa Picture Tubes, Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in semiconductor technology.

Collaborations

Cheng has collaborated with several talented individuals in his field, including Min-Lun Wu and Che-Wei Chang. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the semiconductor industry.

Conclusion

Min-Chung Cheng is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His innovative patents and career achievements highlight his dedication to advancing the field. Through his contributions, he continues to shape the future of electronic devices.