The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Apr. 08, 2022
Nanya Technology Corporation, New Taipei, TW;
Min-Chung Cheng, Taoyuan, TW;
NANYA TECHNOLOGY CORPORATION, New Taipei, TW;
Abstract
A method for preparing a semiconductor device is provided. The method includes forming a first dielectric layer over a semiconductor substrate, and forming a conductive contact penetrating through the first dielectric layer. The method also includes forming a lower landing pad over the conductive contact, and forming a second dielectric layer covering the lower landing pad. The method further includes etching the second dielectric layer to form a first opening exposing the lower landing pad, and forming an upper landing pad in the first opening. The lower landing pad and the upper landing pad form a T-shaped landing pad structure.