Company Filing History:
Years Active: 2014
Title: Miki Tsuruta: Innovator in Photoresist Composition
Introduction
Miki Tsuruta is a prominent inventor based in Kurashiki, Japan. She has made significant contributions to the field of materials science, particularly in the development of photoresist compositions. With a total of 2 patents, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Miki Tsuruta's latest patents include the N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition. These patents disclose N-acyl-β-lactam derivatives represented by a specific general formula, which lead to a photoresist composition capable of controlling an acid diffusion length to be short. The polymer obtained by polymerizing the N-acyl-β-lactam derivative serves as one of the starting materials for this composition. The structural variables in the formula include R, which can represent a hydrogen atom, a methyl group, or a trifluoromethyl group, and W, which can represent an alkylene or cycloalkylene group.
Career Highlights
Miki Tsuruta is currently employed at Kuraray Co., Ltd., where she continues to innovate and develop new materials. Her work has been instrumental in advancing the capabilities of photoresist materials used in various applications.
Collaborations
Throughout her career, Miki has collaborated with notable colleagues, including Takashi Fukumoto and Shuji Matsunaga. These collaborations have contributed to her success and the advancement of her research.
Conclusion
Miki Tsuruta is a trailblazer in the field of photoresist compositions, with her innovative patents paving the way for future advancements. Her contributions to materials science are significant and continue to impact the industry positively.