The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Aug. 02, 2013
Applicants:
Takashi Fukumoto, Tainai, JP;
Shuji Matsunaga, Saijo, JP;
Miki Tsuruta, Kurashiki, JP;
Inventors:
Assignee:
Kuraray Co., Ltd., Kurashiki-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07D 205/08 (2006.01); G03F 7/004 (2006.01); C08F 26/06 (2006.01); G03F 7/039 (2006.01); C08F 226/06 (2006.01); C08F 20/26 (2006.01); C08F 20/34 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 226/06 (2013.01); C07D 205/08 (2013.01); C08F 20/26 (2013.01); C08F 20/34 (2013.01); G03F 7/039 (2013.01);
Abstract
Provided are N-acyl-β-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, where the structural variables are as defined herein.