The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Aug. 27, 2010
Takashi Fukumoto, Tainai, JP;
Shuji Matsunaga, Saijo, JP;
Miki Tsuruta, Kurashiki, JP;
Kuraray Co., Ltd., Kurashiki-shi, JP;
Abstract
Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer. In the formula, Rrepresents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R, R, R, and Rindependently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) Rand R, or Rand R, may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) Rand Rmay be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R, R, R, and Rare not a hydrogen atom at the same time.