Kuraray Co., Ltd.

Miki Tsuruta

Takashi Fukumoto

Shuji Matsunaga

Provided are N-acyl-&#x3b2;-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-&#x3b2;-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, where the structural variables are as defined herein.

N-acyl-&#x3b2;-lactam derivative, macromolecular compound, and photoresist composition

Disclosed are an N-acyl-&#x3b2;-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-&#x3b2;-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer.  In the formula, Rrepresents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R, R, R, and Rindependently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) Rand R, or Rand R, may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) Rand Rmay be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R, R, R, and Rare not a hydrogen atom at the same time.

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Kurashiki, Japan

Miki Tsuruta