Mihoko Nakamura

Title: Mihoko Nakamura: Innovator in Ion Beam Processing Technology

Introduction

Mihoko Nakamura is a prominent inventor based in Chofu, Japan. She has made significant contributions to the field of ion beam processing, holding a total of four patents. Her innovative work focuses on enhancing the precision and efficiency of processing methods used in fine pattern applications.

Latest Patents

Mihoko Nakamura's latest patents include an ion beam processing device and an ion beam processing method. The objective of these inventions is to inhibit the deposition of redeposited films, particularly when working with fine patterns. In her approach, ion beam processing is conducted in such a way that the etching amount of the ion beam is greater in the extending directions of pattern trenches formed on a substrate. This technique allows for the effective processing of fine patterns while preventing redeposited films from accumulating in the bottom portions of the trenches.

Career Highlights

Mihoko Nakamura is currently employed at Canon Anelva Corporation, where she continues to develop innovative technologies in her field. Her work has been instrumental in advancing ion beam processing techniques, making her a key figure in the industry.

Collaborations

Mihoko has collaborated with notable colleagues, including Yoshimitsu Kodaira and Isao Takeuchi. These partnerships have contributed to her success and the development of her patented technologies.

Conclusion

Mihoko Nakamura's contributions to ion beam processing technology highlight her role as an influential inventor. Her innovative patents and ongoing work at Canon Anelva Corporation continue to shape the future of processing methods in the industry.