The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Jun. 19, 2012
Applicants:
Tomohiko Toyosato, Tokyo, JP;
Mihoko Nakamura, Chofu, JP;
Kazuhiro Kimura, Inagi, JP;
Masayoshi Ikeda, Hachioji, JP;
Inventors:
Tomohiko Toyosato, Tokyo, JP;
Mihoko Nakamura, Chofu, JP;
Kazuhiro Kimura, Inagi, JP;
Masayoshi Ikeda, Hachioji, JP;
Assignee:
Canon Anelva Corporation, Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/02 (2006.01); H01L 43/12 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01);
Abstract
In a method for manufacturing the functional element, a protective film covering an underlayer, a patterned multilayer film, and a patterned cap layer are formed, and the underlayer is then processed without newly forming a resist. Thereby, an electrode can be formed in steps less than ever before. Since the protective film formed on the patterned multilayer film and the patterned cap layer is used as a mask, the problem of the misregistration can be prevented.