Kawasaki, Japan

Tomohiko Toyosato


Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Tokyo, JP (2015)
  • Kawasaki, JP (2017)
  • Kanagawa, JP (2019)

Company Filing History:


Years Active: 2015-2019

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3 patents (USPTO):Explore Patents

Title: The Innovations of Tomohiko Toyosato

Introduction

Tomohiko Toyosato is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing and magnetic devices. With a total of three patents to his name, Toyosato's work focuses on improving the efficiency and effectiveness of ion beam etching methods.

Latest Patents

One of Toyosato's latest patents is an ion beam etching method of magnetic film and an ion beam etching apparatus. This invention aims to restrict the generation of particles or deterioration in process reproducibility caused by a large amount of carbon polymers generated in a plasma generation portion during the etching of a magnetic film on a substrate. The method involves introducing a first carbon-containing gas into the plasma generation portion and a second carbon-containing gas into the substrate processing space. This approach allows for the etching of a magnetic material at a preferable selection ratio and etching rate while minimizing the formation of carbon polymers.

Another notable patent is a substrate processing method and a method of manufacturing a semiconductor device. This invention provides a method that enables a material to be fully embedded into a recess portion with a deposition film left in the recess. The method includes a first irradiation step that removes part of the deposition film using a particle beam at a specific angle, followed by a second irradiation step that further removes the remaining deposition film at a different angle.

Career Highlights

Tomohiko Toyosato is currently employed at Canon Anelva Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of ion beam etching processes, which are critical in the manufacturing of high-performance electronic devices.

Collaborations

Throughout his career, Toyosato has collaborated with notable colleagues, including Masayoshi Ikeda and Kazuhiro Kimura. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Tomohiko Toyosato's contributions to the field of semiconductor manufacturing and magnetic devices highlight his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of the challenges in the industry and offer practical solutions that enhance manufacturing processes.

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