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For the Inventor, By the Inventor

Veldhoven, Netherlands

Miguel Garcia Granda

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Miguel Garcia Granda. Retrieved from https://idiyas.com/inventor/miguel-garcia-granda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 71.4

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:

goldMedal7 out of 5,075 
 
Asml Netherlands B.v.
 patents

Years Active: 2016-2026

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7 patents (USPTO):Explore Patents
1. 12638785 - Methods for measuring at least one target on a substrate and associated apparatuses and substrate (2026-05-26),
2. 11385554 - Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate (2022-07-12),
3. 10895811 - Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method (2021-01-19),
4. 10871716 - Metrology robustness based on through-wavelength similarity (2020-12-22),
5. 10571812 - Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method (2020-02-25),
6. 10394132 - Metrology robustness based on through-wavelength similarity (2019-08-27),
7. 9518936 - Method and apparatus for determining lithographic quality of a structure (2016-12-13),

Title: Unveiling the Innovations of Inventor Miguel Garcia Granda

Introduction:

In the realm of technological advancements, inventor Miguel Garcia Granda has been a driving force behind several groundbreaking innovations. Hailing from Veldhoven, NL, he has left a significant mark with his inventive solutions. Let's delve into the world of Miguel Garcia Granda and explore his latest patents and career highlights.

Latest Patents:

Miguel Garcia Granda's latest patents revolve around metrology apparatus and methods for determining characteristics related to structures on substrates. Specifically, he has introduced a method for determining a characteristic of interest, such as focus, in structures formed by a lithographic process. This groundbreaking approach involves forming modified substrate features using corresponding reticle features, ultimately enhancing metrology accuracy in lithographic systems. Additionally, his focus on optimizing geometric parameters for focus performance measurement showcases his dedication to precision in device manufacturing methods.

Career Highlights:

Miguel Garcia Granda's career has been intertwined with innovation and excellence, particularly at ASML Netherlands B.V. (previously written all in capital letters). Within this renowned company, he has spearheaded projects that push the boundaries of technological advancements in the semiconductor industry. His expertise in lithographic processes and metrology has been pivotal in shaping the future of precision manufacturing.

Collaborations:

In his journey towards innovation, Miguel Garcia Granda has collaborated with esteemed coworkers such as Frank Staals and Bart Peter Bert Segers. Together, they have synergized their skills and knowledge to drive forward projects that redefine industry standards. The spirit of teamwork and collaboration has been instrumental in Miguel's success and the accomplishments of his patents.

Conclusion:

In conclusion, Miguel Garcia Granda stands as a trailblazer in the field of technological innovation. Through his latest patents and collaborative efforts, he continues to revolutionize the landscape of metrology and lithography. His contributions to ASML Netherlands B.V. and the industry at large underscore his commitment to excellence and ingenuity. Miguel Garcia Granda's inventive spirit paves the way for a future adorned with groundbreaking advancements and precision engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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