Inba-gun, Japan

Michio Aruga


Average Co-Inventor Count = 2.6

ph-index = 10

Forward Citations = 1,897(Granted Patents)


Location History:

  • Chiba, JP (1995 - 1996)
  • Inba, JP (1996)
  • Tomisato, JP (1997)
  • Narita, JP (2003)
  • Inba-gun, JP (1996 - 2006)

Company Filing History:


Years Active: 1995-2006

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14 patents (USPTO):Explore Patents

Title: Innovative Contributions of Michio Aruga

Introduction

Michio Aruga is a prominent inventor hailing from Inba-gun, Japan, known for his contributions to the field of plasma processes and thin-film deposition. With a remarkable portfolio of 14 patents, he has significantly advanced technologies that play a vital role in various industries.

Latest Patents

Among his latest patents, Michio Aruga has developed an innovative apparatus for reducing plasma charge damage during plasma processes. The method involves depositing a thin film on a substrate within a process chamber with minimized incidence of plasma charge damage. A process gas containing suitable precursor gases is flowed into the chamber, and a plasma is generated to facilitate the thin film deposition. Notably, his technique allows for the thin film to be deposited at the center of the substrate more rapidly than at the edges, enhancing efficiency and performance.

The other patent, titled "Method of reducing plasma charge damage for plasma processes," mirrors the innovative approach of his apparatus. This method also focuses on reducing plasma charge damage through optimized gas flow and plasma generation techniques, showcasing his expertise in this critical area of technology.

Career Highlights

Throughout his career, Michio Aruga has made significant contributions while working for leading companies such as Applied Materials, Inc. His innovative mindset and dedication to improving plasma process technologies have positioned him as a key figure in the field.

Collaborations

Michio Aruga has collaborated with esteemed colleagues, including Susan G. Telford and Meng Chu Tseng. Their joint efforts have contributed to advancements in thin-film technology and plasma processes, further solidifying Michio's status as an influential inventor in the industry.

Conclusion

Michio Aruga's innovative patents and collaborative efforts highlight his dedication to advancing plasma processing technologies. His work not only reflects his ingenuity as an inventor but also contributes substantially to the ongoing evolution of the industry.

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