Michelle K Jensen

Title: Michelle K Jensen: Innovator in Chemical Mechanical Polishing Technology

Introduction

Michelle K Jensen is a prominent inventor based in Newark, PA (US), known for her significant contributions to the field of chemical mechanical polishing technology. With a total of nine patents to her name, she has made remarkable advancements that enhance the efficiency and effectiveness of polishing processes in various applications.

Latest Patents

Among her latest patents, Jensen has developed a chemical mechanical polishing pad with a polishing layer and an endpoint detection window. This innovative pad incorporates a plug-in-place window that comprises a reaction product of specific ingredients, including a window prepolymer and a window curative system. The curative system consists of at least 5 wt % of a window difunctional curative, at least 5 wt % of a window amine-initiated polyol curative, and 25 to 90 wt % of a window high molecular weight polyol curative. Another notable patent is her soft and conditionable chemical mechanical window polishing pad, which features a polishing layer made from a reaction product of a polyfunctional isocyanate and a curative package. This polishing layer exhibits impressive properties, including a density greater than 0.6 g/cm, a Shore D hardness of 5 to 40, and an elongation to break of 100 to 450%. These innovations are accompanied by methods for making and using the chemical mechanical polishing pad.

Career Highlights

Throughout her career, Michelle K Jensen has worked with leading companies in the industry, including Rohm and Haas Electronic Materials CMP Holdings, Inc. and Dow Global Technologies LLC. Her experience in these organizations has allowed her to refine her expertise and contribute to groundbreaking advancements in polishing technology.

Collaborations

Jensen has collaborated with notable professionals in her field, including John Gifford Nowland and Bainian Qian. These partnerships have fostered innovation and have been instrumental in the development of her patented technologies.

Conclusion

Michelle K Jensen's work in chemical mechanical polishing technology exemplifies her dedication to innovation and excellence. Her patents and collaborations reflect her significant impact on the industry, making her a key figure in advancing polishing technologies.