Location History:
- Atascadero, CA (US) (2002)
- Pleasanton, CA (US) (2003 - 2005)
- Astascadero, CA (US) (2004 - 2005)
Company Filing History:
Years Active: 2002-2005
Title: The Innovations of Michael S. Lacy
Introduction
Michael S. Lacy is a prominent inventor based in Pleasanton, CA (US). He has made significant contributions to the field of chemical mechanical planarization (CMP) with a total of 11 patents to his name. His work focuses on enhancing the efficiency and effectiveness of polishing processes in semiconductor manufacturing.
Latest Patents
Among his latest patents is an "Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection." This invention provides a method and apparatus for maintaining a stable environment in the cavity surrounding the optical pathway during CMP operations. The system includes a rotating platen that supports an optical view-port assembly, which assists in determining the thickness of a substrate layer. Additionally, a polishing pad with an aperture overlying the optical view-port assembly is utilized, along with a fluid delivery system to ensure a consistent environment during the CMP process.
Another notable patent is for "Subaperture chemical mechanical planarization with polishing pad conditioning." This invention outlines a method for polishing an object by conditioning a noncontact portion of the polishing pad while it is in motion. This innovative approach allows for effective polishing of the target surface while optimizing the use of the polishing pad.
Career Highlights
Michael S. Lacy has worked with several notable companies in the semiconductor industry, including Lam Research Corporation and Strasbaugh. His experience in these organizations has contributed to his expertise in CMP technologies and innovations.
Collaborations
Throughout his career, Lacy has collaborated with talented individuals such as John Boyd and David G. Halley. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.
Conclusion
Michael S. Lacy's contributions to the field of chemical mechanical planarization have significantly advanced the technology used in semiconductor manufacturing. His innovative patents and collaborations with industry professionals highlight his dedication to improving manufacturing processes.