Location History:
- Kodaira, JP (2012)
- Tokyo, JP (2013)
- Jena, DE (2017)
- Berlin, DE (2013 - 2020)
Company Filing History:
Years Active: 2012-2020
Title: Michael Himmelhaus: Innovator in Optical Measurement Systems
Introduction
Michael Himmelhaus is a prominent inventor based in Berlin, Germany. He has made significant contributions to the field of optical measurement systems, holding a total of 7 patents. His work focuses on improving measurement accuracy and image generation techniques in microlithography.
Latest Patents
Himmelhaus's latest patents include a method for correcting the distortion of a first imaging optical unit of a first measurement system. This method aims to enhance the measurement accuracy of optical units. Another notable patent is a method and device for generating a reference image in the characterization of a mask for microlithography. This invention involves simulating the imaging of a mask with various structures, utilizing both rigorous and Kirchhoff simulations to produce a hybrid spectrum and generate a reference image.
Career Highlights
Throughout his career, Himmelhaus has worked with esteemed companies such as Fujirebio Inc. and Carl Zeiss SMT GmbH. His experience in these organizations has allowed him to develop innovative solutions in optical technologies and measurement systems.
Collaborations
Himmelhaus has collaborated with notable professionals in his field, including Dirk Seidel and Carsten Schmidt. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Michael Himmelhaus is a distinguished inventor whose work in optical measurement systems has led to several impactful patents. His contributions continue to shape the future of imaging technologies in various applications.