Fujirebio Inc.

Carl Zeiss Smt Gmbh

Michael Himmelhaus

Dirk Seidel

Carsten Schmidt

Susanne Toepfer

Elka Trivela

Petra Bücker

Oliver Worsfold

Sören Schilp

Conor D Whitehouse

Hatice Acunman

Alexandre Francois

Reiner Dahint

A method for correcting the distortion of a first imaging optical unit of a first measurement system is provided, wherein the first imaging optical unit has a first measurement accuracy and the method comprises the steps of:

Method for correcting the distortion of a first imaging optical unit of a first measurement system

The invention relates to a method and a device for generating a reference image in the characterization of a mask for microlithography, wherein the mask comprises a plurality of structures and wherein the reference image is generated by simulation of the imaging of said mask, said imaging being effected by a given optical system, both using a rigorous simulation and using a Kirchhoff simulation, wherein the method comprises the following steps: assigning each structure of said plurality of structures either to a first category or to a second category, calculating a plurality of first partial spectra for structures of the first category with implementation of rigorous simulations, calculating a second partial spectrum for structures of the second category with implementation of a Kirchhoff simulation, generating a hybrid spectrum on the basis of the first partial spectra and the second partial spectrum, and generating the reference image with implementation of an optical forward propagation of said hybrid spectrum in the optical system.

Method and device for generating a reference image in the characterization of a mask for microlithography

A method for ascertaining distortion properties of an optical system in a measurement system for microlithography is provided, wherein the optical system images at least one structure to be measured into a measurement image. In accordance with one aspect, a method according to the invention comprises the following steps: measuring the field-dependent image aberrations of the optical system; determining a first distortion pattern present in the first image field generated by the optical system during measurement of at least one predefined structure; carrying out an optical forward simulation for the predefined structure taking account of the field-dependent image aberrations measured previously, with a second image field being generated; determining a second distortion pattern for the second image field generated previously; and ascertaining the structure-independent distortion properties of the optical system by calculating a third distortion pattern as the difference between the first distortion pattern and the second distortion pattern.

Method for ascertaining distortion properties of an optical system in a measurement system for microlithography

The present invention relates to a method for producing small structures includes: depositing a mask on a surface of a substrate; and evaporating a source material under such evaporation condition performed at such pressure to form a layer onto both a shadowed surface area and a non-shadowed surface area of the mask and the substrate.

Method and apparatus for producing small structures

A method for sensing a target object using optical mode excitations in microresonators, comprises: preparing at least one cluster including at least two microresonators; obtaining some first spectra of the cluster; adsorbing the target object on a surface of the cluster; obtaining some second spectra of the cluster; and sensing the target object by comparing a lineshape of the first spectra with a lineshape of the second spectra.

Clusters of microresonators for cavity mode optical sensing

The present invention relates to a particle comprising a non-metallic core having a fluorescent material and a metallic shell encapsulating the non-metallic core wherein the metallic shell has transparency for an electromagnetic radiation having a first wavelength to excite the said fluorescent material and reflectance for an electromagnetic radiation having a second wavelength emitted by the said fluorescent material to confine the electromagnetic radiation having the second wavelength in the metallic shell. This system allows for the excitation of optical cavity modes inside the particle even at sub-micron particle size. The cavity modes are extremely sensitive to any change of the dielectric environment of the particle. This sensitivity can be used for the construction of optical nano-biosensors. Another application of the system is that of a microscopic source for spherical light waves, which may find applications in digital inline holography and display technology.

Fluorescent non-metallic particles encapsulated in a metallic coating

The invention provides a chip comprising a substrate with at least one surface and a layer of particles having a non-metallic core and a coating made of a metal or a metal alloy, characterized in that each non-metallic core, on average, forms a metal-surrounded contact point with at least one other non-metallic core and/or the substrate surface. The invention also provides a method for preparing a chip, comprising the steps of, The chip can be employed in optical devices for the detection of analytes.

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Berlin, Germany

Michael Himmelhaus