Company Filing History:
Years Active: 2003-2004
Title: Mia Honoré: Innovator in Semiconductor Technology
Introduction
Mia Honoré is a prominent inventor based in Kortenberg, Belgium. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approach to manufacturing semiconductor devices.
Latest Patents
One of her latest patents is titled "Semiconductor device with selectively diffused regions." This invention describes a method of manufacturing a semiconductor device that involves several key steps. The process begins with selectively applying a pattern of a solids-based dopant source to a first major surface of a semiconductor substrate. Following this, dopant atoms are diffused into the substrate through a controlled heat treatment step in a gaseous environment. This results in the formation of a first diffusion region directly from the dopant source and a second diffusion region indirectly via the gaseous environment. Finally, a metal contact pattern is formed in alignment with the first diffusion region without significantly etching the second diffusion region.
Career Highlights
Mia has worked with notable organizations such as Imec Vzw and the Interuniversitair Microelektronica Centrum (imec). Her experience in these institutions has allowed her to collaborate on various projects that advance semiconductor technology.
Collaborations
Some of her coworkers include Jörg Horzel and Jozef Szlufcik, who have contributed to her research and development efforts in the semiconductor field.
Conclusion
Mia Honoré's work in semiconductor technology exemplifies her innovative spirit and dedication to advancing the industry. Her patents reflect her expertise and commitment to improving manufacturing processes in this critical field.