Chungcheongnam-do, South Korea

Mi-Hwa Lim

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Chungeheongnam-do, KR (2012)
  • Chungcheongnam-do, KR (2011 - 2015)

Company Filing History:


Years Active: 2011-2015

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6 patents (USPTO):

Title: Mi-Hwa Lim: Innovator in Photoelectric Conversion Technology

Introduction

Mi-Hwa Lim is a prominent inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of photoelectric conversion devices, holding a total of 6 patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.

Latest Patents

Among his latest patents, Mi-Hwa Lim has developed a method of manufacturing a photoelectric conversion device. This device features a semiconductor substrate with a protective layer on the front side and a non-single crystalline semiconductor layer on the back side. The design includes a first conductive layer with a specific impurity on one portion of the back side and a second conductive layer with multiple impurities on another portion. This innovative approach enhances the efficiency and functionality of photoelectric conversion devices.

Career Highlights

Mi-Hwa Lim has worked with notable companies such as Samsung SDI Co., Inc. and Samsung Display Co., Ltd. His experience in these leading organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.

Collaborations

Throughout his career, Mi-Hwa Lim has collaborated with talented individuals, including Min-Seok Oh and Czang-Ho Lee. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the field.

Conclusion

Mi-Hwa Lim's contributions to photoelectric conversion technology exemplify his dedication to innovation and excellence. His patents and collaborations reflect a commitment to advancing the semiconductor industry. His work continues to inspire future developments in this vital field.

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