Meng-Chiang Wang

Title: Meng-Chiang Wang: Semiconductor Device Inventor

Introduction

Meng-Chiang Wang is an inventor associated with Tainan, Taiwan, and United Microelectronics Corporation. His patent work concerns semiconductor device design and fabrication.

Latest Patents

Wang is credited with 1 patent: “Semiconductor Device and Method of Forming the Same.” The invention describes a semiconductor device with a substrate containing fins that extend in a first direction, a well, and a dummy cell region at the well’s boundary. The region includes an isolation structure and gate structures positioned over a shallow trench isolation structure that crosses one of the fins in a perpendicular direction. The patent also describes a method for forming the device.

Career Highlights

Wang’s listed patent reflects work on fin-based semiconductor structures and the arrangement of isolation and gate features. His association with United Microelectronics Corporation connects his invention to the semiconductor industry.

Collaborations

Yi-Chung Sheng and Sheng-Yuan Hsueh are identified as Wang’s coworkers. The available information does not specify their roles in the patent or whether they collaborated on this invention.

Conclusion

Meng-Chiang Wang’s recorded patent focuses on a semiconductor device structure and its fabrication, highlighting his contribution to semiconductor innovation.