Meiyee Shek

Title: Meiyee Shek: Innovator in Semiconductor Technology

Introduction

Meiyee Shek is a prominent inventor based in Mountain View, CA (US). She has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. Her work focuses on improving the efficiency and reliability of semiconductor devices.

Latest Patents

One of her latest patents is titled "Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer." This invention provides a method and apparatus for treating a substrate by forming a porous dielectric layer. In some embodiments, the dielectric may be capped by a dense dielectric layer. The dense conformal dielectric layer seals the pores of the porous dielectric layer against contact with species that may infiltrate the pores. Another notable patent is "Reduction of hillocks prior to dielectric barrier deposition in Cu damascene." This invention addresses the issue of unwanted hillocks arising in copper layers due to the formation of overlying barrier layers. By optimizing various process parameters, the formation of these hillocks can be significantly reduced.

Career Highlights

Meiyee Shek is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her innovative work has positioned her as a key figure in advancing semiconductor manufacturing processes.

Collaborations

Throughout her career, Meiyee has collaborated with notable colleagues, including Li-Qun Xia and Hichem M'Saad. These collaborations have further enhanced her research and development efforts in semiconductor technology.

Conclusion

Meiyee Shek's contributions to semiconductor technology through her patents and collaborations highlight her role as an influential inventor in the field. Her work continues to pave the way for advancements in semiconductor manufacturing processes.