Matsuzaka, Japan

Mayumi Kimura


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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2 patents (USPTO):Explore Patents

Title: Mayumi Kimura: Innovator in Etching Technologies

Introduction

Mayumi Kimura is a prominent inventor based in Matsuzaka, Japan. She has made significant contributions to the field of etching technologies, particularly in the development of etchant compositions and methods. With a total of two patents to her name, her work has implications for various industries, including electronics and materials science.

Latest Patents

Kimura's latest patents include an etchant composition and an etching liquid composition. The etchant composition is designed to etch silicon-containing films on target substrates. It comprises a blend of organic compounds containing hydroxyl and carbonyl groups, inorganic acids, hydrofluoric acid, ammonium fluoride, and organic acids. This innovative formulation enhances the etching process, ensuring precision and effectiveness.

The etching liquid composition focuses on etching metal films, such as aluminum and aluminum alloys, with excellent controllability. It prevents resist bleeding and achieves a desirable taper configuration and superior flatness. This composition utilizes a water solution containing phosphoric acid, nitric acid, and organic acid salts, with specific concentrations to optimize performance.

Career Highlights

Throughout her career, Mayumi Kimura has worked with notable companies, including Hayashi Pure Chemical Industry, Ltd. and Sanyo Electric Co., Ltd. Her experience in these organizations has allowed her to refine her expertise in etching technologies and contribute to advancements in the field.

Collaborations

Kimura has collaborated with esteemed colleagues, including Tsuguhiro Tago and Atsushi Matsui. These partnerships have fostered innovation and have been instrumental in her research and development efforts.

Conclusion

Mayumi Kimura's contributions to etching technologies through her patents and collaborations highlight her role as a leading inventor in her field. Her work continues to influence advancements in materials processing and electronics.

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