The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Aug. 17, 2012
Applicants:
Atsushi Matsui, Taki-gun Mie, JP;
Mayumi Kimura, Matsuzaka, JP;
Tsuguhiro Tago, Osaka, JP;
Inventors:
Assignee:
HAYASHI PURE CHEMICAL IND., LTD., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C09K 13/08 (2006.01); H01L 21/311 (2006.01); C09K 13/06 (2006.01); H01L 21/306 (2006.01); C09K 13/00 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); C09K 13/00 (2013.01); C09K 13/06 (2013.01); H01L 21/30604 (2013.01); H01L 21/31111 (2013.01); H01L 21/31144 (2013.01);
Abstract
This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.