Company Filing History:
Years Active: 2005-2009
Title: Max Wei: Innovator in Semiconductor Technology
Introduction
Max Wei is a prominent inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on advanced methods for contact formation and retrograde wells in substrates.
Latest Patents
Max Wei's latest patents include innovative techniques that enhance semiconductor manufacturing processes. One of his notable patents is for "Self-aligned contact formation utilizing sacrificial polysilicon." This method involves forming a spacer layer over a substrate with patterned stacks and trenches, followed by the deposition of a sacrificial polysilicon layer to fill the trenches. The process includes etching the sacrificial layer to create open regions for contact formation. Another significant patent is for "High concentration indium fluorine retrograde wells." This invention describes a method and apparatus for creating a high-concentration indium-fluorine retrograde well within a substrate, achieving an indium concentration greater than about 3E18/cm3.
Career Highlights
Max Wei is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to push the boundaries of technology and contribute to the advancement of the industry.
Collaborations
Max has collaborated with notable colleagues, including Cory E Weber and Mark Armstrong. Their combined expertise has fostered innovation and development in their projects.
Conclusion
Max Wei is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in the field. His contributions continue to shape the future of technology and innovation.