The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Dec. 31, 2003
Applicants:
Cory E. Weber, Hillsboro, OR (US);
Mark A. Armstrong, Portland, OR (US);
Stephen M. Cea, Hillsboro, OR (US);
Giuseppe Curello, Portland, OR (US);
Sing-chung HU, San Jose, CA (US);
Aaron D. Lilak, Hillsboro, OR (US);
Max Wei, San Jose, CA (US);
Inventors:
Cory E. Weber, Hillsboro, OR (US);
Mark A. Armstrong, Portland, OR (US);
Stephen M. Cea, Hillsboro, OR (US);
Giuseppe Curello, Portland, OR (US);
Sing-Chung Hu, San Jose, CA (US);
Aaron D. Lilak, Hillsboro, OR (US);
Max Wei, San Jose, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/80 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus to form a high-concentration, indium-fluorine retrograde well within a substrate. The indium-fluorine retrograde well includes an indium concentration greater than about 3E18/cm3.