Tainan, Taiwan

Mau-Phon Houng

This inventor holds 5 USPTO granted patents. Top assignee: National Science Council. Active years: 1999-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mau-Phon Houng. Retrieved from https://idiyas.com/inventor/mau-phon-houng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1999-2004

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5 patents (USPTO):Explore Patents

Title: The Innovations of Mau-Phon Houng

Introduction

Mau-Phon Houng is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for improving electrical properties in silicon oxides and fabricating metal oxide semiconductor field effect transistors (MOSFETs). With a total of 5 patents to his name, his work is recognized for its impact on the future of ultra-large scale integration (ULSI) processes.

Latest Patents

One of his latest patents is titled "Method of surface treatment on the improvement of electrical properties for doped silicon oxides (SiO2) films." This invention addresses the challenges in the fabrication of gate oxides in integrated circuit processes. It proposes a simple two-step hydrogen fluoride (HF) etching process that effectively removes native oxides and reduces surface microroughness. The results show a significant increase in breakdown field and a reduction in interface trap density, making it a valuable technique for obtaining high-quality silicon oxide for ultrathin gate oxides.

Another significant patent is the "Method for fabricating metal oxide semiconductor field effect transistor (MOSFET)." This method utilizes low-temperature liquid phase oxidation for III-V group semiconductors. It outlines a comprehensive process that includes forming an epitaxial layer, defining drain and source regions, and creating an oxide layer through low-temperature oxidation. The inclusion of rapid thermal annealing further enhances the quality of the oxide, showcasing Houng's innovative approach to semiconductor manufacturing.

Career Highlights

Mau-Phon Houng is affiliated with the National Science Council, where he continues to advance research in semiconductor technologies. His work has not only contributed to academic knowledge but also has practical implications for the electronics industry. His innovative methods are paving the way for more efficient and cost-effective semiconductor devices.

Collaborations

Throughout his career, Houng has collaborated with esteemed colleagues such as Yeong-Her Wang and Hwei-Heng Wang. These partnerships have fostered a collaborative environment that enhances the research and development of new technologies in the semiconductor field.

Conclusion

Mau-Phon Houng's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the field. His work is instrumental in shaping the future of electronic devices, making him a significant figure

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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