This inventor holds 2 USPTO granted patents. Top assignees: Etec Systems, Inc., Intel Corporation. Active years: 2001-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2010
Title: Innovations by Matthew F Vernon
Introduction
Matthew F Vernon is an accomplished inventor based in Los Gatos, CA. He has made significant contributions to the field of photolithography, particularly in the semiconductor industry. With a total of 2 patents, his work focuses on improving the efficiency and accuracy of lithography processes.
Latest Patents
One of his latest patents is titled "Holder for carrying a photolithography mask in a flattened condition." This invention describes a holder designed to carry a photolithography mask in a flattened state. The holder includes a mask chuck and is capable of flattening a mask for use in photolithography. In one example, the holder features a substrate and multiple independently controllable actuators that are coupled to the substrate and the photolithography mask, allowing for effective flattening.
Another notable patent is "Correction for systematic, low spatial frequency critical dimension variations in lithography." This patent addresses systematic variations in critical dimension feature sizes that depend on substrate coordinates in scanning lithography. The invention compensates for low-frequency variations in critical dimensions caused by imperfections in the lithography tool, resist, or process steps. By utilizing a secondary scanning exposure with a weaker intensity and larger diameter exposure beam, the invention allows for relative critical dimension control with minimal impact on throughput and fabrication costs.
Career Highlights
Matthew has worked with prominent companies in the technology sector, including Intel Corporation and Etec Systems, Inc. His experience in these organizations has contributed to his expertise in the field of semiconductor manufacturing and photolithography.
Collaborations
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Conclusion
Matthew F Vernon is a notable inventor whose work in photolithography has led to significant advancements in the semiconductor industry. His innovative patents demonstrate his commitment to improving lithography processes and enhancing manufacturing efficiency.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile