The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Sep. 29, 2006
Applicant:
Matthew F. Vernon, Los Gatos, CA (US);
Inventor:
Matthew F. Vernon, Los Gatos, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/62 (2006.01);
U.S. Cl.
CPC ...
Abstract
A holder is described for carrying a photolithography mask in a flattened condition. The holder may include a mask chuck and may be able to flatten a mask for use in photolithography. In one example, the holder may include a substrate and a plurality of independently controllable actuators coupled to the substrate and coupled to a photolithography mask to flatten the photolithography mask.