This inventor holds 5 USPTO granted patents. Top assignees: Nikon Corporation, Shin-Etsu Chemical Co., Ltd., Kabushiki Kaisha Toshiba. Active years: 2006-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
4 out of 8,995 
4 out of 5,989 
2 out of 53,262 
Years Active: 2006-2008
Title: Masayuki Nakatsu: Innovator in Photomask Technology
Introduction
Masayuki Nakatsu is a prominent inventor based in Niigata-ken, Japan. He has made significant contributions to the field of photomask technology, holding a total of 5 patents. His work focuses on enhancing the quality and precision of photomask substrates used in semiconductor manufacturing.
Latest Patents
Among his latest patents are innovations related to photomask blank substrates and methods for their production. One notable patent describes a quadrangular photomask blank substrate with a length on each side of at least 6 inches. This substrate features a pair of strip-like regions that extend from 2 to 10 mm inside opposing sides along the outer periphery of the substrate's top surface. The design includes a 2 mm edge portion excluded at each end, with each strip-like region inclined downward toward the outer periphery. The patent emphasizes that the difference between maximum and minimum height values for the strip-like regions is at most 0.5 μm, ensuring good surface flatness during wafer exposure. Another patent outlines a method for making photomask blank substrates by polishing a starting substrate to achieve specific flatness, resulting in minimal warping during exposure.
Career Highlights
Masayuki Nakatsu has worked with notable companies in the industry, including Shin-Etsu Chemical Co., Ltd. and Nikon Corporation. His experience in these organizations has allowed him to develop and refine his innovative approaches to photomask technology.
Collaborations
Throughout his career, Nakatsu has collaborated with esteemed colleagues such as Tsuneo Numanami and Masayuki Mogi. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.
Conclusion
Masayuki Nakatsu's contributions to photomask technology have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his dedication to improving the precision and quality of photomask substrates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile