The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Jun. 27, 2003
Yukio Inazuki, Niigata-ken, JP;
Masayuki Nakatsu, Niigata-ken, JP;
Tsuneo Numanami, Niigata-ken, JP;
Atsushi Tajika, Niigata-ken, JP;
Hideo Kaneko, Niigata-ken, JP;
Satoshi Okazaki, Niigata-ken, JP;
Yukio Inazuki, Niigata-ken, JP;
Masayuki Nakatsu, Niigata-ken, JP;
Tsuneo Numanami, Niigata-ken, JP;
Atsushi Tajika, Niigata-ken, JP;
Hideo Kaneko, Niigata-ken, JP;
Satoshi Okazaki, Niigata-ken, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
In a phase shift mask blank comprising a transparent substrate and a phase shift film thereon, after the phase shift film is formed on the substrate, it is surface treated with ozone water having an ozone concentration of at least 1 ppm. The resulting phase shift film is of quality in that it experiences minimized changes of phase difference and transmittance upon immersion in chemical liquid during subsequent mask cleaning step or the like.