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Niigata-ken, Japan

Tsuneo Numanami

USPTO Granted Patents = 6 (Patent Applications = 1)

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 12(Granted Patents)

Location History:

Niigata-ken, JP (2006 - 2008)
Jyoetsu, JP (2015)

Company Filing History:

Shin-etsu Chemical Co., Ltd.

Nikon Corporation

2 out of 52,735

Kabushiki Kaisha Toshiba

Shin-estu Chemical Co., Ltd.

where one patent can have more than one assignee

Years Active: 2006-2015

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6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8956463 - Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatus (2015-02-17),

2. 7351504 - Photomask blank substrate, photomask blank and photomask (2008-04-01),

3. 7344808 - Method of making photomask blank substrates (2008-03-18),

4. 7329475 - Method of selecting photomask blank substrates (2008-02-12),

5. 7179567 - Phase shift mask blank, phase shift mask, and method of manufacture (2007-02-20),

6. 7070888 - Method of selecting photomask blank substrates (2006-07-04),

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