Location History:
- Niigata-ken, JP (2006 - 2008)
- Jyoetsu, JP (2015)
Company Filing History:
5 out of 5,989 
4 out of 8,907 
2 out of 52,789 
Years Active: 2006-2015
Title: Tsuneo Numanami: Innovator in Photomask Cleaning Technologies
Introduction
Tsuneo Numanami is a notable inventor based in Niigata-ken, Japan. He has made significant contributions to the field of photomask cleaning technologies, holding a total of 6 patents. His innovative methods have advanced the efficiency and effectiveness of cleaning processes in the semiconductor industry.
Latest Patents
Among his latest patents, Numanami has developed a method for cleaning photomask-related substrates. This method addresses contamination by sulfate ions, utilizing pure water to remove these ions effectively. A crucial step in his process involves deaerating the pure water before it is used for cleaning. Additionally, he has designed a cleaning fluid supplying apparatus that filters the cleaning fluid to remove foreign matter before it is supplied to the cleaning apparatus. His work on photomask blank substrates has also been groundbreaking, focusing on achieving excellent surface flatness during wafer exposure.
Career Highlights
Throughout his career, Tsuneo Numanami has worked with prominent companies such as Shin-Etsu Chemical Co., Ltd. and Nikon Corporation. His experience in these leading organizations has allowed him to refine his expertise in photomask technologies and contribute to significant advancements in the field.
Collaborations
Numanami has collaborated with esteemed colleagues, including Masayuki Nakatsu and Masayuki Mogi. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Tsuneo Numanami's contributions to photomask cleaning technologies have established him as a key figure in the semiconductor industry. His innovative methods and collaborative efforts continue to influence advancements in this critical field.