The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2008
Filed:
Jul. 23, 2004
Masayuki Nakatsu, Niigata-ken, JP;
Tsuneo Numanami, Niigata-ken, JP;
Masayuki Mogi, Niigata-ken, JP;
Masamitsu Itoh, Yokohama, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Naoto Kondo, Tokyo, JP;
Masayuki Nakatsu, Niigata-ken, JP;
Tsuneo Numanami, Niigata-ken, JP;
Masayuki Mogi, Niigata-ken, JP;
Masamitsu Itoh, Yokohama, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Naoto Kondo, Tokyo, JP;
Shin-Estu Chemical Co., Ltd., Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Provided that a pair of strip-like regions extend from 2 mm to 10 mm inside each of a pair of opposing sides along an outer periphery of a top surface of a substrate on which a mask pattern is to be formed, with a 2 mm edge portion excluded at each end in a lengthwise direction thereof, the height from a least squares plane for the strip-like regions on the substrate top surface to the strip-like regions is measured at intervals of 0.05-0.35 mm in horizontal and vertical directions, and a substrate in which the difference between the maximum and minimum values for the height among all the measurement points is νoτ μoρε τηαν 0.5 μm is selected.