Masayuki Mogi

Title: Masayuki Mogi: Innovator in Photomask Technology

Introduction

Masayuki Mogi is a prominent inventor based in Niigata-ken, Japan. He has made significant contributions to the field of photomask technology, holding a total of 5 patents. His work focuses on enhancing the quality and precision of photomask substrates used in semiconductor manufacturing.

Latest Patents

Mogi's latest patents include innovations such as a photomask blank substrate and a method for making photomask blank substrates. The quadrangular photomask blank substrate features a length of at least 6 inches, with strip-like regions that extend inward from opposing sides. These regions are designed to maintain a height difference of at most 0.5 micrometers, ensuring excellent surface flatness during wafer exposure. The method of making these substrates involves polishing a starting substrate to achieve specific flatness, resulting in minimal warping during exposure, which is crucial for achieving high accuracy in pattern writing.

Career Highlights

Throughout his career, Masayuki Mogi has worked with notable companies such as Shin-Etsu Chemical Co., Ltd. and Nikon Corporation. His experience in these leading organizations has allowed him to refine his expertise in photomask technology and contribute to advancements in the semiconductor industry.

Collaborations

Mogi has collaborated with esteemed colleagues, including Tsuneo Numanami and Masayuki Nakatsu. These partnerships have fostered innovation and have been instrumental in the development of cutting-edge photomask technologies.

Conclusion

Masayuki Mogi's contributions to photomask technology have significantly impacted the semiconductor industry. His innovative patents and collaborations with leading companies and colleagues highlight his role as a key figure in advancing this critical field.