The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
Jul. 23, 2004
Masayuki Nakatsu, Niigata-ken, JP;
Tsuneo Numanami, Niigata-ken, JP;
Masayuki Mogi, Niigata-ken, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Naoto Kondo, Tokyo, JP;
Masayuki Nakatsu, Niigata-ken, JP;
Tsuneo Numanami, Niigata-ken, JP;
Masayuki Mogi, Niigata-ken, JP;
Tsuneyuki Hagiwara, Tokyo, JP;
Naoto Kondo, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A photomask blank substrate is selected for use in a process where at least a masking film or a phase shift film is deposited on a top surface of a photomask blank substrate to form a photomask blank, the deposited film is patterned to form a photomask, and the photomask is mounted in an exposure tool. The substrate is selected by simulating a change in shape in the top surface of the substrate, from prior to film deposition thereon to when the photomask is mounted in the exposure tool; determining the shape of the substrate top surface prior to the change that will impart to the top surface a flat shape when the photomask is mounted in the exposure tool; and selecting, as an acceptable substrate, a substrate having this top surface shape. The selected substrate has an optimized top surface shape that improves productivity in photomask fabrication.