The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Dec. 02, 2003
Hideo Kaneko, Nakakubiki-gun, JP;
Yukio Inazuki, Nakakubiki-gun, JP;
Tetsushi Tsukamoto, Nakakubiki-gun, JP;
Masayuki Mogi, Nakakubiki-gun, JP;
Katsuya Okumura, Shinjuku-ku, JP;
Hideo Kaneko, Nakakubiki-gun, JP;
Yukio Inazuki, Nakakubiki-gun, JP;
Tetsushi Tsukamoto, Nakakubiki-gun, JP;
Masayuki Mogi, Nakakubiki-gun, JP;
Katsuya Okumura, Shinjuku-ku, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A photomask blank having a film of at least one layer formed on a substrate is manufactured by forming a film on a substrate and irradiating the film with light from a flash lamp. A photomask is manufactured from the thus manufactured photomask blank by forming a patterned resist on the film on the blank by photolithography, etching away those portions of the film which are not covered with the resist, and removing the resist. The photomask blank and photomask have minimized warpage and improved chemical resistance.