Niigata, Japan

Atsushi Tajika

This inventor holds 1 USPTO granted patent. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Tajika. Retrieved from https://idiyas.com/inventor/atsushi-tajika

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Atsushi Tajika: Pioneering Inventor Pushing the Boundaries of Innovation

Introduction: Atsushi Tajika, a visionary inventor hailing from Niigata-ken, JP, is known for his unwavering passion for pushing the boundaries of what is possible through innovation. Tajika's legacy is one of creativity, perseverance, and a relentless pursuit of excellence in the world of inventions.

Latest Patents: Atsushi Tajika holds one patent titled "Phase shift mask blank, phase shift mask, and method of manufacture." This patent focuses on enhancing the quality of phase shift masks by utilizing ozone water treatment, ultimately resulting in minimized changes in phase difference and transmittance during subsequent mask cleaning steps.

Career Highlights: Tajika is associated with Shin-Etsu Chemical Co., Ltd., a renowned company in the field of chemical manufacturing. His innovative work in advancing phase shift mask technology showcases his commitment to excellence and dedication to driving impactful change in the industry.

Collaborations: Throughout his career, Atsushi Tajika has collaborated with esteemed colleagues such as Yukio Inazuki and Masayuki Nakatsu. Together, they have leveraged their expertise to drive forward groundbreaking inventions and contribute significantly to the field of materials science.

Conclusion: Atsushi Tajika's remarkable journey as an inventor is a testament to his pioneering spirit and dedication to innovation. His work not only inspires the next generation of inventors but also highlights the importance of pushing the boundaries of what is possible to create a better future for all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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