Company Filing History:
Years Active: 2018-2024
Title: Inventor Masayuki Kajiwara: Innovations in Substrate Processing Technology
Introduction
Masayuki Kajiwara is a distinguished inventor based in Koshi, Japan, renowned for his contributions to the field of substrate processing technology. With a total of three patents to his name, Kajiwara has made significant advancements that enhance the efficiency and functionality of substrate processing apparatuses.
Latest Patents
Kajiwara’s latest innovations include a substrate processing apparatus, a control method, and a computer-readable storage medium. This substrate processing apparatus is designed to effectively discharge a processing liquid onto a substrate using a specialized nozzle. The apparatus features a liquid feeder that supplies the processing liquid and a replenishment part that ensures the liquid feeder remains filled.
Another notable patent is the treatment solution supply apparatus. This apparatus facilitates the delivery of a treatment solution through a supply path equipped with a filter to eliminate foreign substances. It utilizes a tubephragm pump and includes both an opening/closing valve and a suck-back valve, managed by a control unit to ensure precise handling of the treatment solution flow.
Career Highlights
Masayuki Kajiwara works for Tokyo Electron Limited, a leading company in the semiconductor sector. His role has been pivotal in advancing technologies that incorporate efficient and effective solutions for substrate processing.
Collaborations
Throughout his career, Kajiwara has collaborated with notable coworkers, including Katsunori Ichino and Tsunenaga Nakashima. Their teamwork has fostered innovation and driven progress in their respective projects, strengthening the framework of their technologies.
Conclusion
Masayuki Kajiwara's work exemplifies the spirit of innovation in the substrate processing industry. With three patents to his credit, his contributions not only enhance technological capabilities but also set a foundation for future advancements in the field.
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