Masayoshi Yamauchi

Title: Masayoshi Yamauchi: Innovator in Pattern Forming Technologies

Introduction

Masayoshi Yamauchi is a notable inventor based in Chofu, Japan. He has made significant contributions to the field of pattern forming methods, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

Yamauchi's latest patents include a pattern forming method that allows for the easy removal of discontinuous portions in a pattern while maintaining low resistance. This method involves a printing step where a pattern intermediate containing a conductive material is printed on a base material, followed by an electroplating treatment. The process ensures that the plating target portion is energized while the discontinuous portion is not, allowing for effective removal during the plating step. His second patent focuses on a substrate with a functional fine line that boasts excellent optical properties and adhesion. This substrate features an undercoat layer made of a hydrophobically modified polyester resin, with a functional fine line that has a specific width range.

Career Highlights

Masayoshi Yamauchi is currently associated with Konica Minolta, Inc., where he continues to develop innovative technologies. His work has significantly impacted the field of pattern forming, enhancing the capabilities of various applications.

Collaborations

Yamauchi has collaborated with notable coworkers, including Hidenobu Ohya and Takenori Omata, contributing to advancements in their shared field of expertise.

Conclusion

Masayoshi Yamauchi's contributions to pattern forming technologies reflect his innovative spirit and dedication to advancing the field. His patents demonstrate a commitment to improving functionality and efficiency in technology applications.