Company Filing History:
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Years Active: 1990-2016
Title: Innovations by Masayasu Tanjo: Pioneering Ion Technology in Kyoto
Introduction: Masayasu Tanjo, an esteemed inventor based in Kyoto, Japan, has made significant contributions to the field of ion technology. With a total of four patents to his name, his work showcases the intricacies of ion sources and their applications in various technological advancements.
Latest Patents: Tanjo's recent innovations include two notable patents. The first patent, titled "Ion source and repeller structure," describes a repeller structure that features a target member capable of being sputtered by plasma to emit ions. This target member incorporates a through-hole that connects the sputterable surface to its reverse side, allowing the repeller body to support it. The materials utilized for the target member include gallium oxide, gallium nitride, gallium phosphide, gallium arsenide, and gallium fluoride, highlighting the advanced materials used in his designs.
The second patent, "Method of controlling ion implantation apparatus," outlines a comprehensive method for managing an ion implantation apparatus. This method includes a mass separator that filters ions based on their mass number and valence, an acceleration tube for adjusting the ion beam's speed, and an energy separator for isolating ions with specific energy levels. During the acceleration mode, Tanjo emphasizes the importance of preventing the acceleration voltage from dropping to zero, ensuring optimal operational efficiency.
Career Highlights: Masayasu Tanjo has established a prominent career in the field of ion technology. He has worked with renowned companies such as Nissin Ion Equipment Co., Ltd. and Nissin Electric Co., Ltd., where he focused on developing innovative solutions that cater to the demands of the industry. His dedication to research and innovation has solidified his reputation as a leader in this specialized area.
Collaborations: Throughout his career, Tanjo has collaborated with notable figures in the field. His co-workers, including Koji Okamoto and Eiji Kamijo, have played significant roles in advancing the projects they have worked on together. These collaborations have fostered a creative environment that encourages the exploration of new ideas and technologies.
Conclusion: Masayasu Tanjo's contributions to the field of ion technology are characterized by innovative patent developments and collaborative efforts with esteemed colleagues. His work not only enhances our understanding of ion sources and implantation methods but also drives advancements in technological applications that benefit various industries. His continued involvement in research and development promises further innovations in the realm of ion technology.