The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Feb. 29, 2012
Applicant:
Masayasu Tanjo, Kyoto, JP;
Inventor:
Masayasu Tanjo, Kyoto, JP;
Assignee:
NISSIN ION EQUIPMENT CO., LTD., Kyoto, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C25B 11/00 (2006.01); C25B 13/00 (2006.01); H01J 27/02 (2006.01); H01J 37/08 (2006.01); H01J 37/317 (2006.01); H01J 27/20 (2006.01);
U.S. Cl.
CPC ...
H01J 27/02 (2013.01); H01J 27/205 (2013.01); H01J 37/08 (2013.01); H01J 37/3171 (2013.01); H01J 2237/081 (2013.01);
Abstract
A repeller structure comprises a target member configured to be sputtered by a plasma to emit given ions, and provided with a through-hole penetrating between a sputterable surface and a reverse surface thereof, and a repeller body which supports the target member while being inserted in the through-hole of the target member, and has a repeller surface exposed on the side of the sputterable surface through the through-hole. The target member is made of a material selected from the group consisting of gallium oxide, gallium nitride, gallium phosphide, gallium arsenide and gallium fluoride.