The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1992
Filed:
Aug. 16, 1990
Kazuhiro Shono, Amagasaki, JP;
Shigeo Sasaki, Amagasaki, JP;
Susumu Katoh, Amagasaki, JP;
Masao Naitou, Kyoto, JP;
Tetsuya Nakanishi, Kyoto, JP;
Naomitsu Fujishita, Amagasaki, JP;
Kazuhiko Noguchi, Amagasaki, JP;
Masayasu Tanjo, Kyoto, JP;
Abstract
An ion implantation apparatus includes an ion source having an arc chamber generating ions and a drawing electrode drawing ions from the arc chamber, a mass separator transporting only ions desired for implantation, an ion implantation chamber in which the material to be implanted by ions is placed, and a controller means for automatically controlling the distance between the arc chamber and the drawing electrode incrementally in accordance with a theoretical calculation using normalized perveance considering the kind of ions to be implanted, the accelerating voltage, and the ion current and current density distribution.