This inventor holds 1 USPTO granted patent. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Nisshin Denki Kaushiki Kaisha. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 1992
Title: Susumu Katoh: Innovator in Ion Implantation Technology
Introduction
Susumu Katoh is a notable inventor based in Amagasaki, Japan. He is recognized for his contributions to the field of ion implantation technology. His innovative work has led to the development of a significant patent that enhances the efficiency of ion implantation processes.
Latest Patents
Katoh holds a patent for an ion implantation apparatus. This apparatus includes an ion source with an arc chamber that generates ions and a drawing electrode that draws ions from the arc chamber. It features a mass separator that transports only the desired ions for implantation. The ion implantation chamber is where the material to be implanted by ions is placed. Additionally, the apparatus includes a controller that automatically adjusts the distance between the arc chamber and the drawing electrode based on theoretical calculations. These calculations utilize normalized perveance, taking into account the type of ions to be implanted, the accelerating voltage, and the ion current and current density distribution. Katoh's patent is a testament to his innovative approach in this specialized field, with a total of 1 patent.
Career Highlights
Throughout his career, Susumu Katoh has worked with prominent companies in the technology sector. He has been associated with Mitsubishi Electric Corporation and Nisshin Electric Co., Ltd. His experience in these organizations has contributed to his expertise in ion implantation technology.
Collaborations
Katoh has collaborated with notable colleagues, including Masao Naitou and Naomitsu Fujishita. Their combined efforts have further advanced the field of ion implantation and have led to significant technological developments.
Conclusion
Susumu Katoh's contributions to ion implantation technology through his innovative patent and collaborations with esteemed colleagues highlight his importance in the field. His work continues to influence advancements in technology and manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile