This inventor holds 3 USPTO granted patents. Top assignee: Vlsi Technology Research Association. Active years: 1980-1983.
Company Filing History:
Years Active: 1980-1983
Title: Masatoshi Migitaka: Innovator in Photomask Technology
Introduction
Masatoshi Migitaka is a notable inventor based in Kokubunji, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of photomasks used in various applications.
Latest Patents
Migitaka's latest patents include a novel photomask design. This photomask comprises a transparent film of conductive material and a light shielding film with a predetermined pattern on a transparent substrate. The pattern film is made of a metallic element with an atomic number not smaller than 25 or a composition containing this metallic element. This innovative structure is particularly suited for cases where the pattern formed on the mask is inspected with an electron beam. The design enhances the contrast of pattern-related information signals, such as backscattered electrons and secondary electrons, when irradiated with an electron beam.
Another significant patent is a method of inspecting and retouching a photomask. This method involves preparing a photomask that has a conductive transparent substance on a major surface of an insulating substrate, along with a mask pattern of an opaque substance on the conductive transparent substance. The mask is then irradiated with an electron beam to inspect and/or retouch it, ensuring high precision in the manufacturing process.
Career Highlights
Masatoshi Migitaka is associated with the VLSI Technology Research Association, where he continues to push the boundaries of photomask technology. His work has been instrumental in advancing the capabilities of photomasks, which are critical in the semiconductor manufacturing process.
Collaborations
Migitaka collaborates with Koichiro Mizukami, contributing to the development of innovative solutions in the field of photomask technology.
Conclusion
Masatoshi Migitaka's contributions to photomask technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, making him a key figure in this specialized field.